New

Polishing Pad X1500

Polishing Pad

The specially developed X1500 Polishing Pad HC for the X1500 Compound ensures maximum speed and is the perfect complement to high-performance polishing. The hardness and density of the polishing pad are ideal for removing sanded imperfections in the shortest possible time. The X1500 Polishing Pad MC, on the other hand, offers the perfect balance between removal rate, speed and safety. Although the slightly reduced hardness of the polishing pad results in a lower removal rate, it also makes it an all-rounder for any surface and any user.

Article numbers and download table

Art.No. Specification KP VE
160.447 HC X1500 / 145 mm 2 200
160.448 HC X1500 / 85 mm 2 500
160.449 MC X1500 / 145 mm 2 200
160.450 MC X1500 / 85 mm 2 500

DESCRIPTION

  • Heat-resistant foam polishing pad with a high hardness level

AREA OF APPLICATION

  • For use with Compound X1500 to rapidly remove sanded imperfections in the topcoat and to remove scratches from OEM paintwork

BENEFIT

  • Sandwich construction provides flexibility, safety, and even pressure distribution
  • Shape- and heat-resistant foam provides maximum performance
  • Suitable for rotary and random orbital poling machines
  • Conical shape provides precise polishing
  • No water, soap, or cleaner required for cleaning – the polishing pad can be cleaned quickly and easily with compressed air

APPLICATION ADVICE

Maximum performance is achieved when used in combination with CS Compound X1500.

Further products

New

Compound X1500 HC